Substrate-Selective Chemical Vapor Deposition of Gold from RAuP(CH3)3 (R = CH2CH3, CH3) at Temperatures Ranging from 25 to 400 °C.

• M. M. Banaszak Holl, P. F. Seidler, S. P. Kowalczyk,F. R. McFeely. Inorg. Chem. 1994 33 510