Self-limiting Chemical Vapor Deposition of an Ultra-thin Silicon Oxide Film.

• K. A. Miller, C. John, K. Z. Zhang, K. T. Nicholson, F. R. McFeely, and M. M. Banaszak Holl. Thin Solid Films 2001 397 78-82.
  See: John, ChrisMcCalmont, Karla A. MillerNicholson, KenZhang, Kangzhan