Greeley, J. Neil

About this team member

Neil graduated from Notre Dame with his PhD in physical chemistry in the fall of 1995. His dissertation (w/ Dennis Jacobs) focused on studies of energy and electron transfer in ion/surface scattering experiments. He obtained his BS in chemistry from Santa Clara College in 1989.

Neil was in charging of designing and building a new set of chambers for surface IR and LEED. He is shown below in front of the completed system. It is directly attached via a gate valve to our reactors and X-ray photoemission spectrometer.

Neil completed a beautiful series of IR experiments of H₈Si₈O₁₂ clusters on Si before moving on to Boise, Idaho.  He now works for Micron.

Publications

• Investigation of Hydridosilsesquioxane-Based Silicon Oxide Deposition on Si(111)-7´7. K.S. Schneider, T. M. Owens, K. T. Nicholson, B. J. Ludwig, J. N. Greeley, B. G. Orr, M. M. Banaszak Holl. Langmuir 2002 18 6233-6241.
• The Reaction of H8Si8O12 with a Chromium Oxide Surface: a model for stainless steel surface modification. J. N Greeley, S. Lee, M. M. Banaszak Holl. Appl. Organomet. Chem. 1999 13 279-285.
• Infrared Study of H10Si10O15 Chemisorbed on Si(100)-2×1. J. N. Greeley, M. M. Banaszak Holl. Inorg. Chem. 1998 37 6014-6017.
• Surface Infrared Studies of Silicon/Silicon Oxide Interfaces Derived from Hydridosilsesquioxane Clusters. J. N. Greeley, L. M. Meeuwenberg, M. M. Banaszak Holl. J. Am. Chem. Soc. 1998 120 7776
• The Role of Extra-Atomic Relaxation in Determining Si 2p Binding Energy Shifts at Silicon/Silicon Oxide Interfaces. K. Z. Zhang, J. N. Greeley, M. M. Banaszak Holl, F. R. McFeely. J. Appl. Phys. 1997 82 2298